EXSOLVE
By: Fei Company
High Brightness, Submicron Ion And Electron Beam Columns Using Field Emission Technology For Scientific And Laboratory Use, Namely, Focused Ion Beam Columns For Ion Lithography, Ion Beam Milling, Secondary Ion Mass Spectroscopy And Mask Repair; Focused Electron Beam Columns For Scientific And Laboratory Use, Namely, Electron Beam Lithography, Electron Beam Microscopy, And Liquid Metal Ion Sources.
Trademark Details
This Brand Name EXSOLVE is applied by Fei Company
This Trademark was applied on date 03 June 2019
This Application has been filed by their agent None
Trademark | EXSOLVE |
Application No | 4322352 |
Filing Dte | 03-06-2019 |
User Detail | Proposed to be used |
Certificate Number | 0 |
Valid Until | |
Goods and Service | High Brightness, Submicron Ion And Electron Beam Columns Using Field Emission Technology For Scientific And Laboratory Use, Namely, Focused Ion Beam Columns For Ion Lithography, Ion Beam Milling, Secondary Ion Mass Spectroscopy And Mask Repair; Focused Electron Beam Columns For Scientific And Laboratory Use, Namely, Electron Beam Lithography, Electron Beam Microscopy, And Liquid Metal Ion Sources. |
Business Name | Fei Company |
Business Type | Private Limited Company |
Business Sector | Manufacturing |
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